Article (Scientific journals)
Monolithic Integration of Ultrafast Photodetector and MESFET in the GaN Material System
Mikulics, M.; Kordoš, P.; Gregušová, D. et al.
2011In IEEE Photonics Technology Letters, 23 (17), p. 1189 - 1191
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Keywords :
Gallium nitride (GaN); metal–semiconductor–field-effect-transistor (MESFET); metal–semiconductor–metal photodetector (MSM PD); terahertz (THz)
Abstract :
[en] We have fabricated and characterized ultrafast metal–semiconductor–metal (MSM) photodetectors integrated with metal–semiconductor–field-effect-transistors (MESFETs) integrated in coplanar strip lines in the GaN/AlN/SiC material system. We recorded electrical transients of the single photodetector as short as 0.9 ps wide by optoelectric pump–probe measurements using 360-nm-wavelength and 100-fs-duration laser pulses. Electric photoresponse transients of the photodetector with 6-mV peak amplitude were amplified by the MESFET, resulting in 4-ps-wide and 35-mV peak amplitude signals. This monolithically integrated optoelectronic circuit is presented as a potential candidate for high-speed ultraviolet optoelectronics
Disciplines :
Electrical & electronics engineering
Identifiers :
UNILU:UL-ARTICLE-2011-333
Author, co-author :
Mikulics, M.
Kordoš, P.
Gregušová, D.
Adam, R.
Kočan, M.
Wu, S.
Zhang, J.
Sobolewski, R.
Grützmacher, D.
Marso, Michel ;  University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Engineering Research Unit
Language :
English
Title :
Monolithic Integration of Ultrafast Photodetector and MESFET in the GaN Material System
Publication date :
2011
Journal title :
IEEE Photonics Technology Letters
ISSN :
1041-1135
eISSN :
1941-0174
Publisher :
IEEE
Volume :
23
Issue :
17
Pages :
1189 - 1191
Peer reviewed :
Peer Reviewed verified by ORBi
Commentary :
1041-1135
Available on ORBilu :
since 10 September 2013

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