Article (Scientific journals)
Fabrication of Laterally Displaced Porous Silicon Filters
Marso, Michel; Wolter, M.; Arens-Fischer, R. et al.
2001In Thin Solid Films, 382 (2001), p. 218-221
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Keywords :
Porous silicon; Dielectric filters; Patterning; Reactive ion etching; Micro-optics; Filter array
Abstract :
[en] Porous silicon superlattices have been used to manufacture laterally displaced dielectric filters with different optical properties on one substrate. Two different fabrication processes for two-colour microfilter arrays are presented. Both methods overcome the problem of non-uniform optical properties of the well-known procedure where two filter stacks are grown one upon another, with subsequent partial removal of the upper filter by reactive ion etching. The novel methods give uniform optical properties of the two filter areas, profiting from the main property of the formation process of porous silicon: the formation of porous silicon occurs only at the porous silicon substrate interface.
Disciplines :
Electrical & electronics engineering
Identifiers :
UNILU:UL-ARTICLE-2009-320
Author, co-author :
Marso, Michel ;  Institut fuer Schicht- und Ionentechnik, Forschungzentrum Juelich GmbH, Postfach 1913, D-52425 Juelich, Germany
Wolter, M.;  Institut fuer Schicht- und Ionentechnik, Forschungzentrum Juelich GmbH, Postfach 1913, D-52425 Juelich, Germany
Arens-Fischer, R.;  Institut fuer Schicht- und Ionentechnik, Forschungzentrum Juelich GmbH, Postfach 1913, D-52425 Juelich, Germany
Lüth, H.;  Institut fuer Schicht- und Ionentechnik, Forschungzentrum Juelich GmbH, Postfach 1913, D-52425 Juelich, Germany
External co-authors :
yes
Language :
English
Title :
Fabrication of Laterally Displaced Porous Silicon Filters
Publication date :
2001
Journal title :
Thin Solid Films
ISSN :
0040-6090
Publisher :
Elsevier Science
Volume :
382
Issue :
2001
Pages :
218-221
Peer reviewed :
Peer Reviewed verified by ORBi
Available on ORBilu :
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