Method for manufacturing a semiconductor thin film

Reference : Method for manufacturing a semiconductor thin film


	Document type :	Patent : Patent
	Discipline(s) :	Physical, chemical, mathematical & earth Sciences : Physics
	To cite this reference:	http://hdl.handle.net/10993/11621

Title :	Method for manufacturing a semiconductor thin film
Language :	English
Author, co-author :	Redinger, Alex [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
	Mousel, Marina [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
	Siebentritt, Susanne [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
Publication date :	28-Oct-2013
Creation date :	2013-10
Publisher :	Ministère de l'Economie et du Commerce Extérieur
Patent/publication number (10-11) :	91986
Priority number (30) :	H01L21/02, H01L21/36
Report number :	B
Country :	Luxembourg
Depositor :	Université de Luxembourg, TDK Corporation, Robert Bosch GmbH
International classification (IPC) (51) :	H01L21/02, H01L21/36
European classification (ECLA) (52) :	H01L21/02, H01L21/36
International protection: country codes (81) :	LU
European protection: country codes (84) :	LU
Permalink :	http://hdl.handle.net/10993/11621

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