0.2µm T-gate InP/InGaAs/InP pHEMT with an InGaP Diffusion Barrier Layer Grown By LP-MOCVD Using an N2-carrier; ; et al in Proceedings of the 26th European Solid State Devices Research Conference, Bologna, Italy, 1996 (1996) Detailed reference viewed: 1226 (1 UL) |
||