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See detail0.2µm T-gate InP/InGaAs/InP pHEMT with an InGaP Diffusion Barrier Layer Grown By LP-MOCVD Using an N2-carrier
Schimpf, K.; Hollfelder, M.; Horstmann, M. et al

in Proceedings of the 26th European Solid State Devices Research Conference, Bologna, Italy, 1996 (1996)

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