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Thin low-temperature gate oxides for vertical field-effect transistor, ,
Goryll, M.; Moers, J.; Trellenkamp, St et al.
2002In Proc. 4th Intern. Conf. Advanced Semicon. Dev. & Microsystems
 

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Disciplines :
Electrical & electronics engineering
Identifiers :
UNILU:UL-CONFERENCE-2009-426
Author, co-author :
Goryll, M.;  Institute of Thin Films and Interfaces, Research Centre Jülich, D-52425 Jülich, Germany
Moers, J.;  Institute of Thin Films and Interfaces, Research Centre Jülich, D-52425 Jülich, Germany
Trellenkamp, St;  Institute of Thin Films and Interfaces, Research Centre Jülich, D-52425 Jülich, Germany
Vescan, L.;  Institute of Thin Films and Interfaces, Research Centre Jülich, D-52425 Jülich, Germany
Marso, Michel ;  Institute of Thin Films and Interfaces, Research Centre Jülich, D-52425 Jülich, Germany
Kordoš, P.;  Institute of Thin Films and Interfaces, Research Centre Jülich, D-52425 Jülich, Germany
Lüth, H.;  Institute of Thin Films and Interfaces, Research Centre Jülich, D-52425 Jülich, Germany
External co-authors :
yes
Language :
English
Title :
Thin low-temperature gate oxides for vertical field-effect transistor, ,
Publication date :
2002
Event name :
4th Intern. Conf. Advanced Semicon. Dev. & Microsystems
Event date :
2002
Main work title :
Proc. 4th Intern. Conf. Advanced Semicon. Dev. & Microsystems
ISBN/EAN :
0-7803-7276-X
Pages :
275-277
Available on ORBilu :
since 26 March 2015

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