[en] In this comparative study we investigate AlGaN/GaN-based unpassivated and passivated HFETs and MOSHFETs with regards to DC-, RF-, and power-performance. For optimal comparability, all devices emanate from the same wafer consisting of a SiC-substrate, a 3 μm GaN- and a 30 nm Al0.28Ga0.72N-layer. Devices are processed simultaneously to a large extend. Passivated devices are coated with a 10 nm thick SiO2-layer between the electrodes, MOSHFETs contain a 10 nm thick SiO2-layer serving as gate-insulator underneath the gate and as conventional passivation-layer between the electrodes. Unpassivated devices serve as reference. We present empirical evidence that MOSHFETs outperform both the conventional and the passivated HFETs with respect to DC-, RF-, and power-performance, and we point out the different mechanisms responsible for the behaviour of the devices.
Disciplines :
Electrical & electronics engineering
Identifiers :
UNILU:UL-ARTICLE-2009-305
Author, co-author :
Heidelberger, G.; Institute of Thin Films and Interfaces (ISG1) and cni - Center of Nanoelectronic Systems for Information Technology, Research Centre Jülich, 52425 Jülich, Germany
Bernát, J.; Institute of Thin Films and Interfaces (ISG1) and cni - Center of Nanoelectronic Systems for Information Technology, Research Centre Jülich, 52425 Jülich, Germany
Gregušová, D.; Institute of Electrical Engineering, Slovak Academy of Sciences, 84104 Bratislava, Slovakia
Fox, A.; Institute of Thin Films and Interfaces (ISG1) and cni - Center of Nanoelectronic Systems for Information Technology, Research Centre Jülich, 52425 Jülich, Germany
Marso, Michel ; Institute of Thin Films and Interfaces (ISG1) and cni - Center of Nanoelectronic Systems for Information Technology, Research Centre Jülich, 52425 Jülich, Germany
Lüth, H.; Institute of Thin Films and Interfaces (ISG1) and cni - Center of Nanoelectronic Systems for Information Technology, Research Centre Jülich, 52425 Jülich, Germany
Kordoš, P.; Institute of Electrical Engineering, Slovak Academy of Sciences, 84104 Bratislava, Slovakia, and Department of Microelectronics, Slovak Technical University, 81219 Bratislava, Slovakia
Language :
English
Title :
Comparative study on unpassivated and passivated AlGaN/GaN HFETs and MOSHFETs
Publication date :
2006
Journal title :
Physica Status Solidi A. Applications and Materials Science